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CBC-ER4 2D Transfer Platform
Two-Dimensional Material Transfer Platform
- Description
- Parameters
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- Video
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1.The two-dimensional material transfer platform typically comprises a micro-system, a high-precision 3D transfer stage, and an integrated vacuum suction and heating sample holder. It can be expanded and combined with glove boxes, evaporation coating systems, CVD/CVD systems, spin coaters, and mask alignment platforms to support wet transfer, dry transfer, and non-atmospheric environment transfer operations for two-dimensional materials.
● Precise Transfer and Stacking: Utilizing high-precision displacement stages enables micrometer-level manipulation and stacking of two-dimensional materials such as graphene, molybdenum disulfide, and boron nitride. This allows for precise control over material layer count, stacking angle, and positioning.
●. Visualized Operation: Equipped with microscopic imaging systems, such as high-resolution optical microscopes or confocal microscopes, enabling real-time observation of material morphology and alignment processes for precise, visualized manipulation during low-dimensional material transfer.
●Multi-environment Adaptability: Enables transfer and stacking of 2D material devices under ultra-clean conditions, inert atmospheres, or vacuum environments, preventing material contamination and oxidation.
●High Stability and Precision: Utilizes nanometer-level displacement stepper motors or piezoelectric ceramic drivers to control XYZ-axis movement and angular rotation of the sample stage. Delivers exceptional stability and accuracy, enabling precise transfer of minute samples smaller than 5μm.
2.Transfer process
(1)Extracting single-layer graphene: Peel the blue film back and forth. When it's almost detached, transfer it onto the silicon wafer. (2)Extracting boron nitride: Peel the blue film back and forth. When it's almost detached, transfer it onto the silicon wafer. Key points: To leave as complete and high-quality graphene/BN as possible on the silicon substrate (consider building a peeling machine—focus on slow, uniform peeling), otherwise graphene may wrinkle or tear during transfer, leaving unusable fragments on the substrate. (3)Use a microscope to select high-quality graphene/BN (rely on experience to distinguish which is graphene, and usable material). Prepare a microscope slide. (4) Position PDMS at the center or along the front edges of the slide. Heat the PDMS to detach graphene from the silicon wafer and transfer it onto a clean silicon substrate. (5)Heat the PDMS again to detach graphene from the silicon substrate and transfer it onto the previously graphene-coated substrate, forming a heterojunction. (6)Finally, transfer this heterojunction onto an electrode-equipped silicon substrate to create an electrode.。
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- Achieving micrometer-level precise, site-specific transfer of materials such as graphene, molybdenum disulfide, and black phosphorus, along with controlled stacking of multilayer van der Waals heterostructures.
- The system includes: a microscopy module, a slide-translation module, a vacuum-adsorption module, a heated sample-stage module, and an isolation module.
- Upgradeable and optional: Electrical Measurement Module (compatible with IV, CV, and other electrical measurement functions)
- Or optical measurement module (compatible with optical modules, featuring photoelectric response and fiber-optic coupling functionality)
(1)Stage size 4"(101.6mm)
(2)Temperature controllable range: Room temperature~200 'c (300 'c, 400 'c, 500 'C optional)
(3)Temperature resolution:0.1"
(4)Temperature control accuracy: 0.1 C
(5)Temperature stability:+1C
(6)Using an independent vacuum control switch to control the vacuum attachment of the stage.(7)The diameter of the central adsorption pore is 0.0196 inches,(8)The diameter of the adsorption ring is 1.5 ", 2.5" (matched with slide specific adsorption holes).(9)Cooling method: Water cooling (cooling from 200 degrees to room temperature only takes 3-5minutes)
(10)Sample stage X-Y movement stroke: 4 inches * 4inches,(11)Mobile accuracy: 10um, with locking device(12)Z-axis lifting and lowering of sample table, stroke 8mm, fine adjustment accuracy 2um, withlocking device
